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Preface: Atomic Layer Deposition Applications 8

Authors :
Elam, Jeffrey W.
De Gendt, Stefan
Londergan, Ana
Bent, Stacey F.
van der Straten, O.
Delabie, Annelies
Roozeboom, F.
Plasma & Materials Processing
Source :
ECS Transactions, 50(13), III-IV. Electrochemical Society, Inc.
Publication Year :
2012

Details

Language :
English
ISSN :
19385862
Database :
OpenAIRE
Journal :
ECS Transactions, 50(13), III-IV. Electrochemical Society, Inc.
Accession number :
edsair.narcis........734a6ca1c986ad96da80ac5b32322c81

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