Thermally induced diffusion phenomena and compound interlayer structural changes in EUV multilayers

Nanoscale multilayered structures are employed as reflective coatings for short wavelengths in a wide range of analytical and imaging technologies. Thermal stability is vital for their functionality. This thesis addresses the thermally induced internal structural changes in Mo/Si-based and La/B-based multilayers, designed for the extreme ultraviolet wavelength range. The focus of the work is to study the diffusion phenomena and the interactions between nanoscale layers, with particular emphasis on the formation of compound interlayers during thermal loading.