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Fabrication and characterization of etched facets in InP for advanced packaging of Photonic Integrated circuits
- Source :
- Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 2-4 November 2014, Enschede, The Netherlands, 107-110, STARTPAGE=107;ENDPAGE=110;TITLE=Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 2-4 November 2014, Enschede, The Netherlands
- Publication Year :
- 2014
- Publisher :
- Twente University, 2014.
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Abstract
- In this work we describe the fabrication and characterization of straight and angled etched facets compatible with the standard COBRA active-passive process. The implementation of these structures enables advanced packaging of photonic integrated circuits with multiple optical inputs and outputs.
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 2-4 November 2014, Enschede, The Netherlands, 107-110, STARTPAGE=107;ENDPAGE=110;TITLE=Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 2-4 November 2014, Enschede, The Netherlands
- Accession number :
- edsair.narcis........4ded6466b2816578cb34c6f1dd5b9406