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Fabrication and characterization of etched facets in InP for advanced packaging of Photonic Integrated circuits

Authors :
Lemos Alvares Dos Santos, R.M.
D'Agostino, D.
Rabbani Haghighi, H.
Smit, M.K.
Leijtens, X.J.M.
Garcia Blanco, S.M.
Boller, K.J.
Sefunc, M.A.
Geuzebroek, D.
Photonic Integration
Source :
Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 2-4 November 2014, Enschede, The Netherlands, 107-110, STARTPAGE=107;ENDPAGE=110;TITLE=Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 2-4 November 2014, Enschede, The Netherlands
Publication Year :
2014
Publisher :
Twente University, 2014.

Abstract

In this work we describe the fabrication and characterization of straight and angled etched facets compatible with the standard COBRA active-passive process. The implementation of these structures enables advanced packaging of photonic integrated circuits with multiple optical inputs and outputs.

Details

Language :
English
Database :
OpenAIRE
Journal :
Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 2-4 November 2014, Enschede, The Netherlands, 107-110, STARTPAGE=107;ENDPAGE=110;TITLE=Proceedings of the 19th Annual Symposium of the IEEE Photonics Benelux Chapter, 2-4 November 2014, Enschede, The Netherlands
Accession number :
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