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High speed deposition of SiO2 films with plasma jet based on capillary dielectric barrier discharge at atmospheric pressure
- Source :
- APPLIED PHYSICS EXPRESS. 1(6)
- Publication Year :
- 2008
- Publisher :
- INST PURE APPLIED PHYSICS, 2008.
Details
- Language :
- English
- ISSN :
- 18820778
- Volume :
- 1
- Issue :
- 6
- Database :
- OpenAIRE
- Journal :
- APPLIED PHYSICS EXPRESS
- Accession number :
- edsair.jairo.........c45103e37762fcc6acede2d14b8f50b2