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[ 183] D. Kitayama, T. Kubota, T. Koyonagi, K. Kakushima, P. Ahmet, K. Tsutsui, A. Nishiyama, N. Sugii, K. Natori, T. Hattori, H. Iwai, 'Silicate Reaction Control at Lanthanum Oxide and Silicon Interface for Equivalent Oxide Thickness of 0.5nm* Adjustment of Amount of Residual Oxygen Atoms in Metal Layer', Japanese Journal of Applied Physics, Vol.50, No.10, pp.10PA05-1-5, October, 2011

Authors :
Koyanagi, Tomotsune
KAKUSHIMA, Kuniyuki
Parhat, Ahmet
TSUTSUI, KAZUO
Sugii, Nobuyuki
NATORI, KENJI
hattori, takeo
IWAI, HIROSHI
Source :
Japanese Journal of Applied Physics. 50(No. 10)
Publication Year :
2011

Details

Language :
English
Volume :
50
Issue :
No. 10
Database :
OpenAIRE
Journal :
Japanese Journal of Applied Physics
Accession number :
edsair.jairo.........91991124eb087fe5dc54bf2c160978e1