Formation of silver nanoparticles aligned near the bottom of SiO2 film silicon substrate by negative-ion implantation and post-annealing

Authors :: Arai, N
Tsuji, H
Ueno, K
Matsumoto, T
Gotoh, N
Aadachi, K
Kotaki, H
Gotoh, Y
Ishikawa, J
Source :: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS. 242(1-2):217-220
Publication Year :: 2006
Publisher :: ELSEVIER SCIENCE BV, 2006.

Subjects :: negative ion
nanoparticles
ion implantation
mono-layered nanoparticles

Language :: English
ISSN :: 0168583X
Volume :: 242
Issue :: 1-2
Database :: OpenAIRE
Journal :: NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS
Accession number :: edsair.jairo.........512787a1936c429fdc91780d8ea17703

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