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Nanoscale Fabrication and Device Applications of lnAs-based Heterostructures using Atomic-Force Microscope
- Source :
- 電気材料技術雑誌. 11(2):134-145
- Publication Year :
- 2002
- Publisher :
- 電気材料技術懇談会, 2002.
-
Abstract
- We describe nanofabrication processes developed for the fabrication of InAs/AIGaSb heterostructures using atomic-force-microscope (AFM) oxidation and applications to the fabrication of nanoscale devices such as single-electron transistors. Oxidation processes were developed for GaSb, GaSb/AlSb, and InAs layers. We demonstrate that our AFM oxidation processes are simple and useful by showing each fabrication process and corresponding device structure and characteristics.
Details
- Language :
- Japanese
- ISSN :
- 09189890
- Volume :
- 11
- Issue :
- 2
- Database :
- OpenAIRE
- Journal :
- 電気材料技術雑誌
- Accession number :
- edsair.jairo.........2c7dc246a08306486f39b7b044c45754