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Enhanced of PL intensity of ZnO films by KCl treatment and its application to FET fabrication
- Source :
- 大阪工業大学紀要 理工篇. 50(2):57-65
- Publication Year :
- 2006
- Publisher :
- 大阪工業大学紀要委員会, 2006.
Details
- Language :
- Japanese
- ISSN :
- 03750191
- Volume :
- 50
- Issue :
- 2
- Database :
- OpenAIRE
- Journal :
- 大阪工業大学紀要 理工篇
- Accession number :
- edsair.jairo.........10be515e9753978045ed97a9fb253446