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Enhanced of PL intensity of ZnO films by KCl treatment and its application to FET fabrication

Authors :
TANAKA, Ryuichiro
ISHII, Hiroaki
ICHIBA, Nobuyasu
MAEMOTO, Toshihiko
SASA, Shigehiko
INOUE , Masataka
Source :
大阪工業大学紀要 理工篇. 50(2):57-65
Publication Year :
2006
Publisher :
大阪工業大学紀要委員会, 2006.

Details

Language :
Japanese
ISSN :
03750191
Volume :
50
Issue :
2
Database :
OpenAIRE
Journal :
大阪工業大学紀要 理工篇
Accession number :
edsair.jairo.........10be515e9753978045ed97a9fb253446