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Role of charged species on the growth of GaN films by modified activated reactive evaporatione
- Source :
- IndraStra Global.
- Publication Year :
- 2011
-
Abstract
- We report the role of charged species N2 + on the growth of GaN films by modified activated reactive evaporation MARE . In MARE technique, substrate is subjected to low energy nitrogen ion bombardment by keeping it in conjunction with the radio frequency cathode. The low energy ion irradiation contributes to the effective formation of GaN as well as in the drastic reduction of the oxygen impurity content by resputtering of the weakly bonded oxygen adatoms. Significant reduction in oxygen impurity can be achieved in the MARE by increasing the concentration of the charged species in the plasma. © 2010 The Electrochemical Society. DOI: 10.1149/1.3512991 All rights reserved.
- Subjects :
- Materials science
General Chemical Engineering
Inorganic chemistry
Analytical chemistry
chemistry.chemical_element
Substrate (electronics)
Electrochemistry
Nitrogen
Oxygen
Evaporation (deposition)
Cathode
law.invention
Ion
Charged species
Growth of GaN
Low energy nitrogen
Low-energy ion irradiation
Modified activated reactive evaporation
Oxygen adatoms
Oxygen impurity
Radio frequencies
Re-sputtering
Gallium alloys
Gallium nitride
Ion bombardment
Ions
Ecology
chemistry
law
General Materials Science
Irradiation
Electrical and Electronic Engineering
Physical and Theoretical Chemistry
Subjects
Details
- Language :
- English
- ISSN :
- 23813652
- Database :
- OpenAIRE
- Journal :
- IndraStra Global
- Accession number :
- edsair.doi.dedup.....ff34ce8d5bb6f5548133707fed8def83
- Full Text :
- https://doi.org/10.1149/1.3512991