Single-Step Dual-Layer Photolithography for Tunable and Scalable Nanopatterning

MLA

Chuanzhen Zhao, et al. “Single-Step Dual-Layer Photolithography for Tunable and Scalable Nanopatterning.” ACS Nano, vol. 15, June 2021, pp. 12180–88. EBSCOhost, https://doi.org/10.1021/acsnano.1c03703.

APA

Chuanzhen Zhao, Jiabao Wang, Wenfei Liu, Xiaobin Xu, Xiuzhen Xu, & Paul S. Weiss. (2021). Single-Step Dual-Layer Photolithography for Tunable and Scalable Nanopatterning. ACS Nano, 15, 12180–12188. https://doi.org/10.1021/acsnano.1c03703

Chicago

Chuanzhen Zhao, Jiabao Wang, Wenfei Liu, Xiaobin Xu, Xiuzhen Xu, and Paul S. Weiss. 2021. “Single-Step Dual-Layer Photolithography for Tunable and Scalable Nanopatterning.” ACS Nano 15 (June): 12180–88. doi:10.1021/acsnano.1c03703.