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Spatio-temporal dynamics of a nanosecond pulsed microwave plasma ignited by time reversal
- Source :
- Plasma Sources Science and Technology, Plasma Sources Science and Technology, IOP Publishing, 2020, 29 (12), pp.125017. ⟨10.1088/1361-6595/abc9ff⟩
- Publication Year :
- 2020
- Publisher :
- HAL CCSD, 2020.
-
Abstract
- In the present paper, a detailed investigation of the spatio-temporal dynamics of the recently developed time reversal microwave plasma source is presented. This novel source allows to ignite a plasma at a desired location in a reverberant cavity by focusing the electromagnetic energy in time and space. An important feature is the possibility to control the plasma position only by changing the input microwave waveform. The source is operated in a repetitive pulsed mode with very low duty cycle (typically 5 × 10−2%). Nanosecond pulses have rise time lower than 1 ns. The generated plasmas have typical sizes in the millimeter range and are observed using imaging for dozens of nanoseconds. The plasma behavior is investigated for different pressures and repetition frequencies. A strong dependence is observed between each discharge pulse suggesting the existence of an important memory effect. The latter is probably due to argon metastable atoms and/or residual charges remaining in the post-discharge and allowing the next breakdown to occur at a moderate electric field.
- Subjects :
- 010302 applied physics
Materials science
Argon
Time reversal
chemistry.chemical_element
Plasma
Nanosecond
Condensed Matter Physics
Microwave plasma
01 natural sciences
Ion source
010305 fluids & plasmas
[SPI.ELEC]Engineering Sciences [physics]/Electromagnetism
Autre
chemistry
Physics::Plasma Physics
Duty cycle
[PHYS.PHYS.PHYS-PLASM-PH]Physics [physics]/Physics [physics]/Plasma Physics [physics.plasm-ph]
Rise time
Electric field
0103 physical sciences
Atomic physics
Microwave
ComputingMilieux_MISCELLANEOUS
Subjects
Details
- Language :
- English
- ISSN :
- 09630252 and 13616595
- Database :
- OpenAIRE
- Journal :
- Plasma Sources Science and Technology, Plasma Sources Science and Technology, IOP Publishing, 2020, 29 (12), pp.125017. ⟨10.1088/1361-6595/abc9ff⟩
- Accession number :
- edsair.doi.dedup.....e9306ec54d360dcebe1265c9a3ade120
- Full Text :
- https://doi.org/10.1088/1361-6595/abc9ff⟩