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Ferroelastic domain wall dynamics in ferroelectric bilayers

Authors :
Miryam Arredondo
Varatharajan Anbusathaiah
Valanoor Nagarajan
Fransiska Cecilia Kartawidjaja
Sergei V. Kalinin
Oleg S. Ovchinnikov
John Wang
Stephen Jesse
Source :
Anbusathaiah, V, Jesse, S, Arredondo-Arechavala, M, Kartawidjaja, F C, Ovchinnikov, O S, Wang, J, Kalinin, S V & Nagarajan, V 2010, ' Ferroelastic domain wall dynamics in ferroelectric bilayers ' Acta Materialia, vol 58(16), no. 16, pp. 5316-5325 . DOI: 10.1016/j.actamat.2010.06.004
Publication Year :
2010
Publisher :
Elsevier BV, 2010.

Abstract

High-performance piezoelectric devices based on ferroelectric materials rely heavily on ferroelastic domain wall switching. Here we present visual evidence for the local mechanisms that underpin domain wall dynamics in ferroelastic nanodomains. State-of-the-art band excitation switching spectroscopy piezoforce microscopy (PFM) reveals distinct origins for the reversible and irreversible components of ferroelastic domain motion. Extrapolating the PFM images to case for uniform fields, we posit that, while reversible switching is essentially a linear motion of the ferroelastic domains, irreversible switching takes place via domain wall twists. Critically, real-time images of in situ domain dynamics under an external bias reveal that the reversible component leads to reduced coercive voltages. Finally, we show that junctions representing three-domain architecture represent facile interfaces for ferroelastic domain switching, and are likely responsible for irreversible processes in the uniform fields. The results presented here thus provide (hitherto missing) fundamental insight into the correlations between the physical mechanisms that govern ferroelastic domain behavior and the observed functional response in domain-engineered thin film ferroelectric devices.

Details

ISSN :
13596454
Volume :
58
Database :
OpenAIRE
Journal :
Acta Materialia
Accession number :
edsair.doi.dedup.....e7113da6fb03bdbd439598e3a55585f6
Full Text :
https://doi.org/10.1016/j.actamat.2010.06.004