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Submicron focusing of XUV radiation from a laser plasma source using a multilayer Laue lens
- Source :
- Applied Physics A. 102:85-90
- Publication Year :
- 2010
- Publisher :
- Springer Science and Business Media LLC, 2010.
-
Abstract
- The focusing properties of a one-dimensional multilayer Laue lens (MLL) were investigated using monochromatic soft X-ray radiation from a table-top, laser-produced plasma source. The MLL was fabricated by a focused ion beam (FIB) structuring of pulsed laser deposited ZrO2/Ti multilayers. This novel method offers the potential to overcome limitations encountered in electron lithographic processes. Utilizing this multilayer Laue lens, a line focus of XUV radiation from a laser-induced plasma in a nitrogen gas puff target could be generated. The evaluated focal length is close to the designed value of 220 μm for the measurement wavelength of 2.88 nm. Divergence angle and beam waist diameter are measured by a moving knife edge and a far-field experiment, determining all relevant second-order moments based beam parameters. The waist diameter has been found to be approximately 370 nm (FWHM). peerReviewed
- Subjects :
- 010302 applied physics
Materials science
Chemistry(all)
business.industry
02 engineering and technology
General Chemistry
021001 nanoscience & nanotechnology
Laser
01 natural sciences
Beam parameter product
Focused ion beam
law.invention
Lens (optics)
Physics
Operating Procedures, Materials Treatment
Surfaces and Interfaces, Thin Films
Characterization and Evaluation of Materials
Nanotechnology
Optical and Electronic Materials
Condensed Matter Physics
Optics
Materials Science(all)
law
Extreme ultraviolet
0103 physical sciences
Focal length
General Materials Science
Laser beam quality
0210 nano-technology
business
Beam (structure)
Subjects
Details
- ISSN :
- 14320630 and 09478396
- Volume :
- 102
- Database :
- OpenAIRE
- Journal :
- Applied Physics A
- Accession number :
- edsair.doi.dedup.....e52dd76e669b128b22b47160a8bfd35f