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Microstrain and residual stress in thin-films made from silver nanoparticles deposited by inkjet-printing technology

Authors :
András Borbély
Romain Cauchois
Karim Inal
Mohamed Saadaoui
Patrice Gergaud
Holst Centre
The Netherlands Organisation for Applied Scientific Research (TNO)
Laboratoire Georges Friedel (LGF-ENSMSE)
École des Mines de Saint-Étienne (Mines Saint-Étienne MSE)
Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT)-Université de Lyon-Centre National de la Recherche Scientifique (CNRS)
Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI)
Direction de Recherche Technologique (CEA) (DRT (CEA))
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
Département Packaging et Supports Souples (PS2-ENSMSE)
Institut Mines-Télécom [Paris] (IMT)-Institut Mines-Télécom [Paris] (IMT)-CMP-GC
Centre de Mise en Forme des Matériaux (CEMEF)
MINES ParisTech - École nationale supérieure des mines de Paris
Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Centre National de la Recherche Scientifique (CNRS)
M. François
G. Montay
B. Panicaud
D. Retraint and E. Rouhaud
Mines Paris - PSL (École nationale supérieure des mines de Paris)
Source :
Advanced Materials Research, 9th European Conference on Residual Stresses, ECRS 2014, 9th European Conference on Residual Stresses, ECRS 2014, Jul 2014, Troyes, France. pp.930-935, ⟨10.4028/www.scientific.net/AMR.996.930⟩, 9th European Conference on Residual Stresses, ECRS 2014, 7 July 2014 through 10 July 2014, Troyes, 996, 930-935
Publication Year :
2014
Publisher :
HAL CCSD, 2014.

Abstract

Colloidal suspensions of nanoparticles are increasingly employed in the fabrication process of electronic devices using inkjet-printing technology and a consecutive thermal treatment. The evolution of internal stresses during the conversion of silver nanoparticle-based ink into a metallic thin-film by a thermal sintering process has been investigated by in-situ XRD using the sin2ψ method. Despite the CTE mismatch at the film/substrate interface, the residual stress in silver films (below 70 MPa) remains lower than in conventional PVD thin-films, as a result of the remaining porosity. A Warren-Averbach analysis further showed that the crystallite growth is associated with a minimization of the twin fault density and the elastic microstrain energy above 150°C. A stabilization of the microstructure and internal stress is observed above 300°C. Inkjetprinting technology thus appears as a good alternative to conventional metallization techniques and offers significant opportunities asset for interconnect and electronic packaging. cop. (2014) Trans Tech Publications, Switzerland. 'Conseil General de l'Aube'; Conseil National de la Recherche Scientifique (CNRS); et al; Grand Troyes; Proto Manufacturing; Region Champagne-Ardenne

Details

Language :
English
Database :
OpenAIRE
Journal :
Advanced Materials Research, 9th European Conference on Residual Stresses, ECRS 2014, 9th European Conference on Residual Stresses, ECRS 2014, Jul 2014, Troyes, France. pp.930-935, ⟨10.4028/www.scientific.net/AMR.996.930⟩, 9th European Conference on Residual Stresses, ECRS 2014, 7 July 2014 through 10 July 2014, Troyes, 996, 930-935
Accession number :
edsair.doi.dedup.....e292ddcec099395ba2156f9c3c7616b8
Full Text :
https://doi.org/10.4028/www.scientific.net/AMR.996.930⟩