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Wavelength dependence of the damage threshold of inorganic materials under extreme-ultraviolet free-electron-laser irradiation

Authors :
Josef Krasa
M. Bergh
Kai Tiedtke
Robert Nietubyć
Stefan P. Hau-Riege
Mark A. McKernan
Dorota Klinger
Carl Caleman
H. Wabnitz
Marek Jurek
Ryszard Sobierajski
Nicusor Timneanu
Libor Juha
Andriy Velyhan
Saša Bajt
Richard A. London
J. Cihelka
Regina Soufli
Richard M. Bionta
Sherry L. Baker
Sven Toleikis
Dmitri Ryutov
Věra Hájková
Jaromír Chalupský
Jerzy B. Pelka
Jacek Krzywinski
Source :
Applied physics letters 95, 111104 (2009). doi:10.1063/1.3216845
Publication Year :
2009
Publisher :
AIP Publishing, 2009.

Abstract

We exposed bulk SiC and films of SiC and B4C to single 25 fs long free-electron-laser pulses with wavelengths between 13.5 and 32 nm. The materials are candidates for x-ray free-electron laser optics. We found that the threshold for surface-damage of the bulk SiC samples exceeds the fluence required for thermal melting at all wavelengths. The damage threshold of the film sample shows a strong wavelength dependence. For wavelengths of 13.5 and 21.7 nm, the damage threshold is equal to or exceeds the melting threshold, whereas at 32 nm the damage threshold falls below the melting threshold.

Details

ISSN :
10773118 and 00036951
Volume :
95
Database :
OpenAIRE
Journal :
Applied Physics Letters
Accession number :
edsair.doi.dedup.....e0e91e84e0225f769c528b1cef4ce912