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Study of the pedestal process for reducing sidewall scattering in photonic waveguides
- Source :
- Scopus, Repositório Institucional da UNESP, Universidade Estadual Paulista (UNESP), instacron:UNESP, Repositório Institucional da USP (Biblioteca Digital da Produção Intelectual), Universidade de São Paulo (USP), instacron:USP
- Publication Year :
- 2017
-
Abstract
- Made available in DSpace on 2018-12-11T16:47:01Z (GMT). No. of bitstreams: 0 Previous issue date: 2017-05-01 Fundação de Amparo à Pesquisa do Estado de São Paulo (FAPESP) Conselho Nacional de Desenvolvimento Científico e Tecnológico (CNPq) In this work we investigate the principles of an alternative method for defining sidewall in optical waveguides fabricated using planar technology. The efficiency of this method is demonstrated through simulations and experimental results regarding propagation losses of a solid core ARROW waveguide fabricated on silicon substrate. It is well known that waveguides fabricated using sidewalls etched via Reactive Ion Etching (RIE) can present high sidewall roughness, especially if metallic hard-masks are used. This is largely responsible for the undesirable losses observed in these waveguides. The basic strategy of the proposed method is to do the etching step, in the fabrication of the waveguides, before the deposition of the core, so as to have the lower cladding layer and part of the silicon substrate etched away. Only after this, is the core of the waveguide deposited. This results in a waveguide sustained by a silicon pedestal. With this process, losses as low as 0.45 dB cm-1 for multimode and 0.84 dB cm-1 for single mode waveguides are obtained. The numerical simulations demonstrate that roughness in sidewalls implicates in propagation losses which are at least five times larger that those in the bulk of the material, thus corroborating the idea behind the proposed method. Escola Politécnica University of São Paulo (USP) São Paulo State University (UNESP) São Paulo State University (UNESP) FAPESP: 2007/00775-1 FAPESP: 2007/0860-9 CNPq: 307349/2014-4 CNPq: 477214/2007-0
- Subjects :
- Materials science
Fabrication
Multi-mode optical fiber
Silicon
business.industry
chemistry.chemical_element
02 engineering and technology
021001 nanoscience & nanotechnology
Cladding (fiber optics)
ÓPTICA
Waveguide (optics)
Atomic and Molecular Physics, and Optics
law.invention
020210 optoelectronics & photonics
Optics
chemistry
law
0202 electrical engineering, electronic engineering, information engineering
Photonics
Reactive-ion etching
0210 nano-technology
ARROW waveguide
business
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- Scopus, Repositório Institucional da UNESP, Universidade Estadual Paulista (UNESP), instacron:UNESP, Repositório Institucional da USP (Biblioteca Digital da Produção Intelectual), Universidade de São Paulo (USP), instacron:USP
- Accession number :
- edsair.doi.dedup.....d6656bc9044d195a6425cb813184018a