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Band‐tailored van der Waals heterostructure for multilevel memory and artificial synapse
- Source :
- InfoMat, Vol 3, Iss 8, Pp 917-928 (2021)
- Publication Year :
- 2021
- Publisher :
- Wiley, 2021.
-
Abstract
- Two‐dimensional (2D) van der Waals heterostructure (vdWH)‐based floating gate devices show great potential for next‐generation nonvolatile and multilevel data storage memory. However, high program voltage induced substantial energy consumption, which is one of the primary concerns, hinders their applications in low‐energy‐consumption artificial synapses for neuromorphic computing. In this study, we demonstrate a three‐terminal floating gate device based on the vdWH of tin disulfide (SnS2), hexagonal boron nitride (h‐BN), and few‐layer graphene. The large electron affinity of SnS2 facilitates a significant reduction in the program voltage of the device by lowering the hole‐injection barrier across h‐BN. Our floating gate device, as a nonvolatile multilevel electronic memory, exhibits large on/off current ratio (~105), good retention (over 104 s), and robust endurance (over 1000 cycles). Moreover, it can function as an artificial synapse to emulate basic synaptic functions. Further, low energy consumption down to ~7 picojoule (pJ) can be achieved owing to the small program voltage. High linearity (
- Subjects :
- tin disulfide
Materials science
business.industry
Materials Science (miscellaneous)
Multilevel memory
band engineering
Heterojunction
Information technology
three‐terminal floating gate memory
T58.5-58.64
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Synapse
symbols.namesake
Band engineering
TA401-492
Materials Chemistry
symbols
artificial synapse
Optoelectronics
van der Waals force
business
van der Waals heterostructure
Materials of engineering and construction. Mechanics of materials
Subjects
Details
- ISSN :
- 25673165
- Volume :
- 3
- Database :
- OpenAIRE
- Journal :
- InfoMat
- Accession number :
- edsair.doi.dedup.....d6200b25c8c133b785b917ced99aea25
- Full Text :
- https://doi.org/10.1002/inf2.12230