Back to Search Start Over

Back-side integration of Hybrid III–V on Silicon DBR lasers

Authors :
Pierre Brianceau
Jacques-Alexandre Dallery
Christophe Jany
Sebastien Cremer
J. Durel
T. Card
Badhise Ben Bakir
Jean-Emmanuel Broquin
Frederic Boeuf
Loic Sanchez
Karim Hassan
R. Thibon
Bertrand Szelag
V. Larrey
T. Bria
R. Guiavarch
STMicroelectronics [Crolles] (ST-CROLLES)
Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI)
Direction de Recherche Technologique (CEA) (DRT (CEA))
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
Vistec Electron Beam GmbH
Institut de Microélectronique, Electromagnétisme et Photonique - Laboratoire d'Hyperfréquences et Caractérisation (IMEP-LAHC )
Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Université Savoie Mont Blanc (USMB [Université de Savoie] [Université de Chambéry])-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])
Source :
2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), 2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), Apr 2017, Hsinchu, Taiwan. pp.1-2, ⟨10.1109/VLSI-TSA.2017.7942492⟩
Publication Year :
2017
Publisher :
HAL CCSD, 2017.

Abstract

International audience; In this paper we demonstrate the monolithic integration of a fully CMOS compatible hybrid DBR laser on the backside of a SOI wafer. This innovative approach allowed implementing CMOS compatible electric interconnects and optical sources on a same chip. The optical characterizations confirm the single wavelength behavior of the realized devices which present a SMSR higher than 35 dB and can be tuned over 4 nm, opening the route to a fully integrated optical transceiver on a Si platform.

Details

Language :
English
Database :
OpenAIRE
Journal :
2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), 2017 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA), Apr 2017, Hsinchu, Taiwan. pp.1-2, ⟨10.1109/VLSI-TSA.2017.7942492⟩
Accession number :
edsair.doi.dedup.....d4cec74ea38e6de6f8bf5be43d335cdf
Full Text :
https://doi.org/10.1109/VLSI-TSA.2017.7942492⟩