Back to Search
Start Over
Abnormal Bias-Temperature Stress and Thermal Instability of <tex-math notation='LaTeX'>$\beta$ </tex-math>-Ga2O3 Nanomembrane Field-Effect Transistor
- Source :
- IEEE Journal of the Electron Devices Society, Vol 6, Pp 1124-1128 (2018)
- Publication Year :
- 2018
- Publisher :
- IEEE, 2018.
-
Abstract
- In this paper, we report on the electrical and thermal instability of β-Ga2O3 nanomembrane field-effect transistor with a bottom-gate configuration. The fabricated device exhibits high electrical performance of field-effect mobility of up to 60.9 cm2/V·s, on/off-current ratio of 109 and subthreshold slope of 210 mV/dec. However, we observe abnormal positive threshold voltage (VTH) shifts under negative bias-temperature stress at an elevated operating temperature of 80 °C as well as under temperature-dependent transfer characteristics up to 200 °C. This abnormal instability is significantly influenced by the surface depletion effect, and is discussed using energy band diagram. The opposite VTH shift was achieved by applying atomic-layer deposited Al2O3 passivation layer.
- Subjects :
- Materials science
Passivation
bias stress
02 engineering and technology
01 natural sciences
Instability
law.invention
Operating temperature
law
0103 physical sciences
Band diagram
Electrical and Electronic Engineering
010302 applied physics
Condensed matter physics
Transistor
β-Ga₂O₃
stability
021001 nanoscience & nanotechnology
Subthreshold slope
Electronic, Optical and Magnetic Materials
Threshold voltage
Field-effect transistor
lcsh:Electrical engineering. Electronics. Nuclear engineering
0210 nano-technology
lcsh:TK1-9971
Biotechnology
Subjects
Details
- Language :
- English
- ISSN :
- 21686734
- Volume :
- 6
- Database :
- OpenAIRE
- Journal :
- IEEE Journal of the Electron Devices Society
- Accession number :
- edsair.doi.dedup.....d2f1547994cf714bd15b30a1936ce4b8