Back to Search Start Over

Thermal response and correlation between mobility and kink effect in GaN HEMTs

Authors :
Ali A. Rezazadeh
Christophe Gaquiere
Mohammad A. Alim
S. Afrin
Institut d’Électronique, de Microélectronique et de Nanotechnologie - UMR 8520 (IEMN)
Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
Puissance - IEMN (PUISSANCE - IEMN)
Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)-Centrale Lille-Institut supérieur de l'électronique et du numérique (ISEN)-Université de Valenciennes et du Hainaut-Cambrésis (UVHC)-Université de Lille-Centre National de la Recherche Scientifique (CNRS)-Université Polytechnique Hauts-de-France (UPHF)
Source :
Microelectronic Engineering, Microelectronic Engineering, Elsevier, 2020, 219, 111148, 5 p. ⟨10.1016/j.mee.2019.111148⟩, Microelectronic Engineering, 2020, 219, 111148, 5 p. ⟨10.1016/j.mee.2019.111148⟩
Publication Year :
2020
Publisher :
HAL CCSD, 2020.

Abstract

International audience; This work notices the relation among the kink effect and the mobility in AlGaN/GaN HEMT and its response to temperature. The kink phenomenon found in transistor behaviour are carefully characterized at persuade point which is straightaway linked to the shallow traps positioned underneath the conduction band. A straightforward relationship among parasitic impacts within the output properties and the existence of deep levels or traps would demonstrate by a temperature-dependent mobility model. This study helps to predict the location of kink voltage in terms of gate bias near to the threshold voltage and also emphasize the impact of the mobility scattering. In expansion, the traps states for GaN HEMT grown on SiC substrate and their related activation energy based on existing literature also summarized.

Details

Language :
English
ISSN :
01679317 and 18735568
Database :
OpenAIRE
Journal :
Microelectronic Engineering, Microelectronic Engineering, Elsevier, 2020, 219, 111148, 5 p. ⟨10.1016/j.mee.2019.111148⟩, Microelectronic Engineering, 2020, 219, 111148, 5 p. ⟨10.1016/j.mee.2019.111148⟩
Accession number :
edsair.doi.dedup.....d238ad62eaeb5122b977c04f7f13cb93