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Thermal response and correlation between mobility and kink effect in GaN HEMTs
- Source :
- Microelectronic Engineering, Microelectronic Engineering, Elsevier, 2020, 219, 111148, 5 p. ⟨10.1016/j.mee.2019.111148⟩, Microelectronic Engineering, 2020, 219, 111148, 5 p. ⟨10.1016/j.mee.2019.111148⟩
- Publication Year :
- 2020
- Publisher :
- HAL CCSD, 2020.
-
Abstract
- International audience; This work notices the relation among the kink effect and the mobility in AlGaN/GaN HEMT and its response to temperature. The kink phenomenon found in transistor behaviour are carefully characterized at persuade point which is straightaway linked to the shallow traps positioned underneath the conduction band. A straightforward relationship among parasitic impacts within the output properties and the existence of deep levels or traps would demonstrate by a temperature-dependent mobility model. This study helps to predict the location of kink voltage in terms of gate bias near to the threshold voltage and also emphasize the impact of the mobility scattering. In expansion, the traps states for GaN HEMT grown on SiC substrate and their related activation energy based on existing literature also summarized.
- Subjects :
- Mobility model
Work (thermodynamics)
Materials science
02 engineering and technology
High-electron-mobility transistor
Activation energy
01 natural sciences
law.invention
[SPI]Engineering Sciences [physics]
law
0103 physical sciences
Electrical and Electronic Engineering
Traps
010302 applied physics
Mobility
Condensed matter physics
Scattering
Kink effect
Transistor
Thermal behaviour
021001 nanoscience & nanotechnology
Condensed Matter Physics
Atomic and Molecular Physics, and Optics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Threshold voltage
AlGaN/GaN FET
0210 nano-technology
Voltage
Subjects
Details
- Language :
- English
- ISSN :
- 01679317 and 18735568
- Database :
- OpenAIRE
- Journal :
- Microelectronic Engineering, Microelectronic Engineering, Elsevier, 2020, 219, 111148, 5 p. ⟨10.1016/j.mee.2019.111148⟩, Microelectronic Engineering, 2020, 219, 111148, 5 p. ⟨10.1016/j.mee.2019.111148⟩
- Accession number :
- edsair.doi.dedup.....d238ad62eaeb5122b977c04f7f13cb93