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Coherent imaging nano-patterning with extreme ultraviolet laser illumination

Authors :
Artak Isoyan
Przemyslaw Wachulak
Yang-Chun Cheng
Franco Cerrina
Jorge J. Rocca
Mario C. Marconi
Carmen S. Menoni
L. Urbanski
F. Jiang
Source :
Scopus-Elsevier

Abstract

We present a high resolution extreme ultraviolet patterning approach based on Talbot self imaging and holographic projection imaging using for illumination a table top extreme ultraviolet laser.

Subjects

Subjects :
Physics
business.industry
Nanophotonics
Holography
X-ray optics
Laser
law.invention
Interferometry
Optics
law
Extreme ultraviolet
Talbot effect
Optoelectronics
business
Lithography

Details

Database :
OpenAIRE
Journal :
Scopus-Elsevier
Accession number :
edsair.doi.dedup.....d213141bd79a1ab200c0c92a494c3734

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