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Adsorption-controlled growth of BiMnO3 thin films by molecular-beam epitaxy

Authors :
June Hyuk Lee
Xiaoshan Xu
D. G. Schlom
Jon F. Ihlefeld
Tassilo Heeg
Zi Kui Liu
J. Schubert
Zhi-Gang Mei
Janice L. Musfeldt
M. Roeckerath
Peter Schiffer
Rajiv Misra
Xianglin Ke
Source :
Applied physics letters 96, 262905 (2010). doi:10.1063/1.3457786
Publication Year :
2010
Publisher :
American Institute of Physics, 2010.

Abstract

We have developed the means to grow BiMnO3 thin films with unparalleled structural perfection by reactive molecular-beam epitaxy and determined its band gap. Film growth occurs in an adsorption-controlled growth regime. Within this growth window bounded by oxygen pressure and substrate temperature at a fixed bismuth overpressure, single-phase films of the metastable perovskite BiMnO3 may be grown by epitaxial stabilization. X-ray diffraction reveals phase-pure and epitaxial films with omega rocking curve full width at half maximum values as narrow as 11 arc sec (0.003 degrees). Optical absorption measurements reveal that BiMnO3 has a direct band gap of 1.1 +/- 0.1 eV. (C) 2010 American Institute of Physics. [doi: 10.1063/1.3457786]

Details

Language :
English
Database :
OpenAIRE
Journal :
Applied physics letters 96, 262905 (2010). doi:10.1063/1.3457786
Accession number :
edsair.doi.dedup.....d10d780d0443374c5b1bb6d48cb0a14a
Full Text :
https://doi.org/10.1063/1.3457786