Structural, optical and electrical characterizations of μc-Si:H films deposited by PECVD

Authors :: M. Ficcadenti
Roberto Vittorio Murri
Ubaldo Coscia
L. Morresi
Giuseppina Ambrosone
Nicola Pinto
Ambrosone, Giuseppina
Coscia, Ubaldo
R., Murri
N., Pinto
M., Ficcadenti
L., Morresi
Source :: Solar Energy Materials and Solar Cells. 87:375-386
Publication Year :: 2005
Publisher :: Elsevier BV, 2005.
Abstract: The effects of the silane concentration f on the structural, optical and electrical properties of undoped hydrogenated silicon films prepared in a plasma-enhanced chemical vapour deposition system have been studied. The electrical conductivity and Hall mobility appear to be controlled by microstructures induced by silane concentration and a clear electrical transport transition from crystalline to amorphous phase has been found when 3%

Subjects :: Silicon
Renewable Energy, Sustainability and the Environment
Chemistry
Concentration effect
chemistry.chemical_element
Mineralogy
Chemical vapor deposition
Microstructure
Silane
Amorphous phase
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
chemistry.chemical_compound
Chemical engineering
Electrical resistivity and conductivity
Plasma-enhanced chemical vapor deposition

Full Text Access

Tools