Cite
Design and modeling of a microwave plasma enhanced chemical vapor deposition system
MLA
Kaviya Aranganadin, et al. “Design and Modeling of a Microwave Plasma Enhanced Chemical Vapor Deposition System.” 2018 IEEE International Conference on Plasma Science (ICOPS), June 2018. EBSCOhost, https://doi.org/10.1109/icops35962.2018.9575914.
APA
Kaviya Aranganadin, Jing-Shyang Yen, Ming-Chieh Lin, Yilang Jiang, & Hua-Yi Hsu. (2018). Design and modeling of a microwave plasma enhanced chemical vapor deposition system. 2018 IEEE International Conference on Plasma Science (ICOPS). https://doi.org/10.1109/icops35962.2018.9575914
Chicago
Kaviya Aranganadin, Jing-Shyang Yen, Ming-Chieh Lin, Yilang Jiang, and Hua-Yi Hsu. 2018. “Design and Modeling of a Microwave Plasma Enhanced Chemical Vapor Deposition System.” 2018 IEEE International Conference on Plasma Science (ICOPS), June. doi:10.1109/icops35962.2018.9575914.