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Influence of the substrate temperature on the Curie temperature and charge carrier density of epitaxial Gd-doped EuO films
- Source :
- Applied physics letters 98, 102110 (2011). doi:10.1063/1.3563708
- Publication Year :
- 2011
- Publisher :
- American Institute of Physics, 2011.
-
Abstract
- Rare earth doping is a standard, yet experimentally poorly understood method to increase the Curie temperature (T-C) of the ferromagnetic semiconductor EuO. Here, we report on the charge carrier density (n) and the T-C of commonly used 4.2 at. % Gd-doped EuO films grown by molecular-beam epitaxy on (110) oriented YAlO3 substrates at various substrate temperatures (T-sub). Increasing T-sub leads to a decrease in n and T-C. For high substrate temperatures the Gd-doping is rendered completely inactive: n and T-C drop to the values of undoped EuO. (C) 2011 American Institute of Physics. [doi:10.1063/1.3563708]
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- Applied physics letters 98, 102110 (2011). doi:10.1063/1.3563708
- Accession number :
- edsair.doi.dedup.....c75122bf3d12f324f711f7cf5206fda9