Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160

Authors :: Y.S. Li
M. Mohammadtaheri
Ozan Gunes
Safa Kasap
Shi-Jie Wen
Chunzi Zhang
Qiaoqin Yang
Rick Wong
Xiaoyu Cui
Source :: Materials, Materials, Vol 13, Iss 5132, p 5132 (2020)
Publication Year :: 2020
Publisher :: MDPI, 2020.
Abstract: The authors would like to correct a typographical error in their paper [...]

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