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Oxygen-vacancy-mediated negative differential resistance in La and Mg co-substituted BiFeO3 thin film
- Source :
- Journal of Applied Physics. 110:124102
- Publication Year :
- 2011
- Publisher :
- AIP Publishing, 2011.
-
Abstract
- The conductive characteristics of Bi0.9La0.1Fe0.96Mg0.04O3(BLFM) thin film are investigated at various temperatures and a negative differential resistance (NDR) is observed in the thin film, where a leakage current peak occurs upon application of a downward electric field above 80 oC. The origin of the NDR behavior is shown to be related to the ionic defect of oxygen vacancies (VO..) present in the film. On the basis of analyzing the leakage mechanism and surface potential behavior, the NDR behavior can be understood by considering the competition between the polarized distribution and neutralization of VO...
- Subjects :
- Condensed Matter - Materials Science
Materials science
Materials Science (cond-mat.mtrl-sci)
FOS: Physical sciences
General Physics and Astronomy
Ionic bonding
chemistry.chemical_element
Oxygen
Oxygen vacancy
chemistry
Chemical physics
Electric field
Thin film
Electrical conductor
Leakage (electronics)
Subjects
Details
- ISSN :
- 10897550 and 00218979
- Volume :
- 110
- Database :
- OpenAIRE
- Journal :
- Journal of Applied Physics
- Accession number :
- edsair.doi.dedup.....bc16b1f2e26a5ad4891d2b4d18d04563
- Full Text :
- https://doi.org/10.1063/1.3668119