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Optimized hole injection with strong electron acceptors at organic-metal interfaces

Authors :
Antje Vollmer
Steffen Duhm
Jürgen P. Rabe
Norbert Koch
Robert L. Johnson
Source :
Physical review letters 95, 237601 (2005). doi:10.1103/PhysRevLett.95.237601
Publication Year :
2005
Publisher :
APS, 2005.

Abstract

The energy-level alignment at interfaces between three electroactive conjugated organic materials and Au was systematically varied by adjusting the precoverage of the metal substrate with the electron acceptor tetrafluoro-tetracyanoquinodimethane (F4-TCNQ). Photoelectron spectroscopy revealed that electron transfer from Au to adsorbed F4-TCNQ was responsible for lowering the hole-injection barrier by as much as 1.2 eV. This novel interface modification scheme is independent of the charge transfer complex formation ability of the organic materials with the electron acceptor.

Details

Language :
English
Database :
OpenAIRE
Journal :
Physical review letters 95, 237601 (2005). doi:10.1103/PhysRevLett.95.237601
Accession number :
edsair.doi.dedup.....b92cbb4e0bcef4706c74a12be1dad178