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MAX-Phase Films Overcome Scaling Limitations to the Resistivity of Metal Thin Films
- Source :
- ACS applied materialsinterfaces. 13(51)
- Publication Year :
- 2021
-
Abstract
- Metal thin films have been widely used as conductors in semiconductor devices for several decades. However, the resistivity of metal thin films such as Cu and TiN increases substantially (1000%) as they become thinner (10 nm) when using high-density integration to improve device performance. In this study, the resistivities of MAX-phase V
- Subjects :
- General Materials Science
Subjects
Details
- ISSN :
- 19448252
- Volume :
- 13
- Issue :
- 51
- Database :
- OpenAIRE
- Journal :
- ACS applied materialsinterfaces
- Accession number :
- edsair.doi.dedup.....b889bf8c74ca7e161e3af9d01c7c20d0