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Soft x-ray free-electron laser induced damage to inorganic scintillators

Authors :
Joachim Schulz
Marion Harmand
Stefan Moeller
Shafagh Dastjani Farahani
J. Wild
Kai Tiedtke
L. Vysin
Karel Saskl
R.A. Loch
Sven Toleikis
Věra Hájková
Saša Bajt
Ryszard Sobierajski
Harald Sinn
Tomáš Burian
Germano Galasso
Jacek Krzywinski
Marek Jurek
Nicola Coppola
Jaromír Chalupský
Libor Juha
Pavel Boháček
Henry N. Chapman
Thomas Tschentscher
Pavol Sovák
C. Ozkan
Mitsuru Nagasono
Jérôme Gaudin
Martin Přeček
Institute of Physics [Prague]
Czech Academy of Sciences [Prague] (CAS)
Faculty of Mathematics and Physics [Praha/Prague]
Charles University [Prague] (CU)
Paul Scherrer Institute (PSI)
European XFEL GmbH (XFEL)
European XFEL GmbH
Center for Free-Electron Laser Science (CFEL)
Deutsches Elektronen-Synchrotron [Hamburg] (DESY)
Centre d'Etudes Lasers Intenses et Applications (CELIA)
Centre National de la Recherche Scientifique (CNRS)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université de Bordeaux (UB)
Photone Sciences, Deutsches Elektronen-Synchrotron (DESY)
Department of Physics [Hamburg]
Universität Hamburg (UHH)
Dutch Institute for Fundamental Energy Research [Eindhoven] (DIFFER)
Institute of Physics, Polish Academy of Sciences
Polska Akademia Nauk = Polish Academy of Sciences (PAN)
SLAC National Accelerator Laboratory (SLAC)
Stanford University
Institut de minéralogie, de physique des matériaux et de cosmochimie (IMPMC)
Muséum national d'Histoire naturelle (MNHN)-Université Pierre et Marie Curie - Paris 6 (UPMC)-Institut de recherche pour le développement [IRD] : UR206-Centre National de la Recherche Scientifique (CNRS)
Institut für Mechanik und Mechatronik, Technische Universität Wien
RIKEN - Institute of Physical and Chemical Research [Japon] (RIKEN)
nstitute of Materials Research, Slovak Academy of Science
Institute of Physics, P. J. Šafárik University
Université de Bordeaux (UB)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Centre National de la Recherche Scientifique (CNRS)
Source :
Optical Materials Express, Optical Materials Express, OSA pub, 2015, 5 (2), pp.254-264. ⟨10.1364/OME.5.000254⟩, Optical Materials Express 5(2), 254-264 (2015). doi:10.1364/OME.5.000254, Optical Materials Express, 2015, 5 (2), pp.254-264. ⟨10.1364/OME.5.000254⟩
Publication Year :
2015
Publisher :
HAL CCSD, 2015.

Abstract

International audience; An irreversible response of inorganic scintillators to intense soft x-ray laser radiation was investigated at the FLASH (Free-electron LASer in Hamburg) facility. Three ionic crystals, namely, Ce:YAG (cerium-doped yttrium aluminum garnet), PbWO4 (lead tungstate), and ZnO (zinc oxide), were exposed to single 4.6 nm ultra-short laser pulses of variable pulse energy (up to 12 μJ) under normal incidence conditions with tight focus. Damaged areas produced with various levels of pulse fluences, were analyzed on the surface of irradiated samples using differential interference contrast (DIC) and atomic force microscopy (AFM). The effective beam area of 22.2 ± 2.2 μm2 was determined by means of the ablation imprints method with the use of poly(methyl methacrylate) - PMMA. Applied to the three inorganic materials, this procedure gave almost the same values of an effective area. The single-shot damage threshold fluence was determined for each of these inorganic materials. The Ce:YAG sample seems to be the most radiation resistant under the given irradiation conditions, its damage threshold was determined to be as high as 660.8 ± 71.2 mJ/cm2. Contrary to that, the PbWO4 sample exhibited the lowest radiation resistance with a threshold fluence of 62.6 ± 11.9 mJ/cm2. The threshold for ZnO was found to be 167.8 ± 30.8 mJ/cm2. Both interaction and material characteristics responsible for the damage threshold difference are discussed in the article.

Details

Language :
English
ISSN :
21593930
Database :
OpenAIRE
Journal :
Optical Materials Express, Optical Materials Express, OSA pub, 2015, 5 (2), pp.254-264. ⟨10.1364/OME.5.000254⟩, Optical Materials Express 5(2), 254-264 (2015). doi:10.1364/OME.5.000254, Optical Materials Express, 2015, 5 (2), pp.254-264. ⟨10.1364/OME.5.000254⟩
Accession number :
edsair.doi.dedup.....b5dd08bb3ddea15ded54fccaac5c4e48
Full Text :
https://doi.org/10.1364/OME.5.000254⟩