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Soft x-ray free-electron laser induced damage to inorganic scintillators
- Source :
- Optical Materials Express, Optical Materials Express, OSA pub, 2015, 5 (2), pp.254-264. ⟨10.1364/OME.5.000254⟩, Optical Materials Express 5(2), 254-264 (2015). doi:10.1364/OME.5.000254, Optical Materials Express, 2015, 5 (2), pp.254-264. ⟨10.1364/OME.5.000254⟩
- Publication Year :
- 2015
- Publisher :
- HAL CCSD, 2015.
-
Abstract
- International audience; An irreversible response of inorganic scintillators to intense soft x-ray laser radiation was investigated at the FLASH (Free-electron LASer in Hamburg) facility. Three ionic crystals, namely, Ce:YAG (cerium-doped yttrium aluminum garnet), PbWO4 (lead tungstate), and ZnO (zinc oxide), were exposed to single 4.6 nm ultra-short laser pulses of variable pulse energy (up to 12 μJ) under normal incidence conditions with tight focus. Damaged areas produced with various levels of pulse fluences, were analyzed on the surface of irradiated samples using differential interference contrast (DIC) and atomic force microscopy (AFM). The effective beam area of 22.2 ± 2.2 μm2 was determined by means of the ablation imprints method with the use of poly(methyl methacrylate) - PMMA. Applied to the three inorganic materials, this procedure gave almost the same values of an effective area. The single-shot damage threshold fluence was determined for each of these inorganic materials. The Ce:YAG sample seems to be the most radiation resistant under the given irradiation conditions, its damage threshold was determined to be as high as 660.8 ± 71.2 mJ/cm2. Contrary to that, the PbWO4 sample exhibited the lowest radiation resistance with a threshold fluence of 62.6 ± 11.9 mJ/cm2. The threshold for ZnO was found to be 167.8 ± 30.8 mJ/cm2. Both interaction and material characteristics responsible for the damage threshold difference are discussed in the article.
- Subjects :
- Materials science
Analytical chemistry
chemistry.chemical_element
Synchrotron radiation
02 engineering and technology
Radiation
01 natural sciences
Fluence
Pulsed laser deposition
law.invention
010309 optics
Optics
law
0103 physical sciences
Irradiation
Radiation resistance
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics]
business.industry
Yttrium
021001 nanoscience & nanotechnology
Laser
Electronic, Optical and Magnetic Materials
chemistry
ddc:620
0210 nano-technology
business
Subjects
Details
- Language :
- English
- ISSN :
- 21593930
- Database :
- OpenAIRE
- Journal :
- Optical Materials Express, Optical Materials Express, OSA pub, 2015, 5 (2), pp.254-264. ⟨10.1364/OME.5.000254⟩, Optical Materials Express 5(2), 254-264 (2015). doi:10.1364/OME.5.000254, Optical Materials Express, 2015, 5 (2), pp.254-264. ⟨10.1364/OME.5.000254⟩
- Accession number :
- edsair.doi.dedup.....b5dd08bb3ddea15ded54fccaac5c4e48
- Full Text :
- https://doi.org/10.1364/OME.5.000254⟩