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Blister formation on rough and technical tungsten surfaces exposed to deuterium plasma
- Source :
- Nuclear Fusion
- Publication Year :
- 2017
- Publisher :
- IOP Publishing, 2017.
-
Abstract
- Up to now, blister formation on rough or technical tungsten surfaces exposed to hydrogen isotope plasma was believed to be completely suppressed. The few dedicated experiments on this issue that can be found in literature appear to support that claim. Using a novel technique of 3D difference imaging of tungsten surfaces, we now demonstrate that roughness introduced by chemical etching, i.e. without the associated mechanical deformation layer introduced by grinding, only moderately reduces blistering. A technical surface with comparable roughness produced by precision grinding (R a ≤ 1.6 µm) led to a strong reduction in blister size and density, but blisters were found nevertheless. In this article we give a detailed description of the investigated rough W surfaces and present a statistical evaluation of blistering on these surfaces after exposure to a low-temperature deuterium plasma.
- Subjects :
- Nuclear and High Energy Physics
Materials science
chemistry.chemical_element
Blisters
Surface finish
Plasma
Tungsten
Condensed Matter Physics
01 natural sciences
Isotropic etching
010305 fluids & plasmas
Grinding
chemistry
0103 physical sciences
medicine
Deformation (engineering)
Composite material
medicine.symptom
010306 general physics
Layer (electronics)
Subjects
Details
- ISSN :
- 17414326, 00295515, 02811847, and 09630252
- Volume :
- 57
- Database :
- OpenAIRE
- Journal :
- Nuclear Fusion
- Accession number :
- edsair.doi.dedup.....b52c5100e929012dbf6ed7c8d0597c88