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Heck arylations of pent-4-enoates or allylmalonate using a palladium/tetraphosphine catalyst

Authors :
Maurice Santelli
Ahmed Battace
Touriya Zair
Henri Doucet
Mhamed Lemhadri
Institut des Sciences Chimiques de Rennes (ISCR)
Université de Rennes (UR)-Institut National des Sciences Appliquées - Rennes (INSA Rennes)
Institut National des Sciences Appliquées (INSA)-Institut National des Sciences Appliquées (INSA)-Ecole Nationale Supérieure de Chimie de Rennes (ENSCR)-Institut de Chimie du CNRS (INC)-Centre National de la Recherche Scientifique (CNRS)
Centre National de la Recherche Scientifique (CNRS)-Institut de Chimie du CNRS (INC)-Université de Rennes 1 (UR1)
Université de Rennes (UNIV-RENNES)-Université de Rennes (UNIV-RENNES)-Ecole Nationale Supérieure de Chimie de Rennes (ENSCR)-Institut National des Sciences Appliquées - Rennes (INSA Rennes)
Institut National des Sciences Appliquées (INSA)-Université de Rennes (UNIV-RENNES)-Institut National des Sciences Appliquées (INSA)
Source :
Journal of Organometallic Chemistry, Journal of Organometallic Chemistry, 2007, 692, pp.2270-2281, Journal of Organometallic Chemistry, Elsevier, 2007, pp.2270-2281
Publication Year :
2007
Publisher :
Elsevier BV, 2007.

Abstract

The Heck reaction of aryl halides with functionalised alk-1-enes should be a powerful method for the synthesis of functionalised (E)-1-arylalk-1-ene derivatives. The major problem of this reaction is the palladium-catalysed migration of the carbon–carbon double bond along the alkyl chain when there are no substituents on the C3 carbon of the alk-1-enes. We observed that for the arylation of ethyl pent-4-enoate, ethyl 2-methylpent-4-enoate or dimethyl allylmalonate this migration could be partially or completely controlled using appropriate reaction conditions. The ramification on the alkyl chain and the substituents on the aryl halide have also an important influence on this migration. Moreover, the cis,cis,cis-1,2,3,4-tetrakis(diphenylphosphinomethyl)cyclopentane/1/2[PdCl(C3H5)]2 system catalyses this reaction with a wide range of aryl bromides using very high ratio substrate/catalyst in good yields.

Details

ISSN :
0022328X
Volume :
692
Database :
OpenAIRE
Journal :
Journal of Organometallic Chemistry
Accession number :
edsair.doi.dedup.....add147172fbca4c12d71f961709c3ea5
Full Text :
https://doi.org/10.1016/j.jorganchem.2007.01.056