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X-ray multilayer monochromator with enhanced performance
- Source :
- Applied optics, Applied optics, Optical Society of America, 2002, 41 (1), pp.239-244. ⟨10.1364/AO.41.000239⟩, Applied optics, Optical Society of America, 2002, 41 (1), pp.239-244. 〈10.1364/AO.41.000239〉, Applied optics, 2002, 41 (1), pp.239-244. ⟨10.1364/AO.41.000239⟩
- Publication Year :
- 2002
- Publisher :
- HAL CCSD, 2002.
-
Abstract
- International audience; An x-ray multilayer monochromator with improved resolution and a low specular background is presented. The monochromator consists of a lamellar multilayer amplitude grating with appropriate parameters used at the zeroth diffraction order. The device is fabricated by means of combining deposition of thin films on a nanometer scale, UV lithography, and reactive ion etching. The performance of this new monochromator at photon energies near 1500 eV is shown.
- Subjects :
- 010302 applied physics
[PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics]
Materials science
[ PHYS.PHYS.PHYS-OPTICS ] Physics [physics]/Physics [physics]/Optics [physics.optics]
business.industry
Materials Science (miscellaneous)
X-ray optics
Grating
01 natural sciences
Industrial and Manufacturing Engineering
Photon counting
law.invention
010309 optics
Optics
law
0103 physical sciences
Business and International Management
Thin film
Reactive-ion etching
Photolithography
business
Diffraction grating
Monochromator
Subjects
Details
- Language :
- English
- ISSN :
- 00036935, 15394522, 1559128X, and 21553165
- Database :
- OpenAIRE
- Journal :
- Applied optics, Applied optics, Optical Society of America, 2002, 41 (1), pp.239-244. ⟨10.1364/AO.41.000239⟩, Applied optics, Optical Society of America, 2002, 41 (1), pp.239-244. 〈10.1364/AO.41.000239〉, Applied optics, 2002, 41 (1), pp.239-244. ⟨10.1364/AO.41.000239⟩
- Accession number :
- edsair.doi.dedup.....a80cbd92ead5816f73454d97cd34f125
- Full Text :
- https://doi.org/10.1364/AO.41.000239⟩