Dilute GaAsN and GaInAsN grown by liquid phase epitaxy

International audience; Dilute III-nitrides, such as GaAsN and GaInAsN, are of considerable current interest both from a fundamental point of view and for applications in solar cells, GaAs-based long-wavelength photodetectors and diode lasers. The addition of nitrogen leads to material properties that deviate strongly from those expected for conventional III-V solid solutions. The possibility was investigated to use liquid phase epitaxy to incorporate nitrogen in epitaxial GaAsN/GaAs and GaInAsN/GaAs heterostructures. The structures were grown from Ga- and Ga-In- melts containing powder GaN as a nitrogen source. The initial growth temperature was varied in the range 560°C − 660°C. The low temperature growth favors nitrogen incorporation in the epilayers. The optical transmission and photoluminescence spectra of a set of structures grown at different temperatures were studied showing ternary and quaternary dilute nitride solid solutions with nitrogen content about 0.2 at.%. The photoluminescence spectra show emission from localized nitrogen states as well.