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Mechanisms of TiN Effective Workfunction Tuning at Interfaces with HfO2 and SiO2
- Publication Year :
- 2020
- Publisher :
- AMER CHEMICAL SOC, 2020.
-
Abstract
- By use of a combination of electrical measurements and internal photoemission interface barrier characterization, the effective workfunction (EWF) changes of nm-thin TiN layer deposited on top of o...
- Subjects :
- Technology
Materials science
PHOTOELECTRON-SPECTROSCOPY
Interface (computing)
Materials Science
chemistry.chemical_element
Materials Science, Multidisciplinary
INITIAL OXIDATION
TITANIUM NITRIDE
THIN-FILMS
XPS
Electrical measurements
Physical and Theoretical Chemistry
Nanoscience & Nanotechnology
MODULATION
DEPOSITION
Science & Technology
business.industry
Chemistry, Physical
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Characterization (materials science)
Chemistry
General Energy
chemistry
ALD
X-RAY-ABSORPTION
Physical Sciences
Optoelectronics
Science & Technology - Other Topics
Tin
business
Layer (electronics)
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Accession number :
- edsair.doi.dedup.....a1b3ae7acfa7ca8910f1fcc21454be8d