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Pulsed Large Signal RF Performance of Field-Plated Ga2O3 MOSFETs
- Source :
- Singh, M, Casbon, M A, Uren, M J, Pomeroy, J W, Dalcanale, S, Karboyan, S, Tasker, P J, Wong, M H, Sasaki, K, Kuramata, A, Yamakoshi, S, Higashiwaki, M & Kuball, M 2018, ' Pulsed Large Signal RF Performance of Field-Plated Ga2O3 MOSFETs ', IEEE Electron Device Letters, vol. 39, no. 10, pp. 1572-1575 . https://doi.org/10.1109/LED.2018.2865832
- Publication Year :
- 2018
-
Abstract
- Comparison between pulsed and CW large signal RF performance of field-plated $\beta $ -Ga2O3 MOSFETs has been reported. Reduced self-heating when pulse resulted in a power added efficiency of 12%, drain efficiency of 22.4%, output power density of 0.13 W/mm, and maximum gain up to 4.8 dB at 1 GHz for a 2- $\mu \text{m}$ gate length device. Increased power dissipation for higher ${V} _{\textsf {DS}}$ and ${I} _{\textsf {DS}}$ resulted in a degradation in performance, which, thermal simulation showed, could be entirely explained by self-heating. Buffer and surface trapping contributions have been evaluated using gate and drain lag measurements, showing minimal impact on device performance. These results suggest that $\beta $ -Ga2O3 is a good candidate for future RF applications.
- Subjects :
- 010302 applied physics
large signal RF
Power-added efficiency
Materials science
pulsed RF
02 engineering and technology
Trapping
Dissipation
021001 nanoscience & nanotechnology
01 natural sciences
Temperature measurement
Electronic, Optical and Magnetic Materials
Ga2O3 MOSFET
power added efficiency (PAE)
pulsed IV
Logic gate
0103 physical sciences
MOSFET
CDTR
Radio frequency
Electrical and Electronic Engineering
Atomic physics
0210 nano-technology
Power density
Subjects
Details
- Language :
- English
- ISSN :
- 07413106
- Database :
- OpenAIRE
- Journal :
- Singh, M, Casbon, M A, Uren, M J, Pomeroy, J W, Dalcanale, S, Karboyan, S, Tasker, P J, Wong, M H, Sasaki, K, Kuramata, A, Yamakoshi, S, Higashiwaki, M & Kuball, M 2018, ' Pulsed Large Signal RF Performance of Field-Plated Ga2O3 MOSFETs ', IEEE Electron Device Letters, vol. 39, no. 10, pp. 1572-1575 . https://doi.org/10.1109/LED.2018.2865832
- Accession number :
- edsair.doi.dedup.....9e50c211103224a4b338ed2b14220071