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Scanning reflection ion microscopy in a helium ion microscope
- Source :
- Beilstein Journal of Nanotechnology, Vol 6, Iss 1, Pp 1125-1137 (2015), Beilstein Journal of Nanotechnology
- Publication Year :
- 2015
- Publisher :
- Beilstein-Institut, 2015.
-
Abstract
- Reflection ion microscopy (RIM) is a technique that uses a low angle of incidence and scattered ions to form an image of the specimen surface. This paper reports on the development of the instrumentation and the analysis of the capabilities and limitations of the scanning RIM in a helium ion microscope (HIM). The reflected ions were detected by their “conversion” to secondary electrons on a platinum surface. An angle of incidence in the range 5–10° was used in the experimental setup. It was shown that the RIM image contrast was determined mostly by surface morphology but not by the atomic composition. A simple geometrical analysis of the reflection process was performed together with a Monte Carlo simulation of the angular dependence of the reflected ion yield. An interpretation of the RIM image formation and a quantification of the height of the surface steps were performed. The minimum detectable step height was found to be approximately 5 nm. RIM imaging of an insulator surface without the need for charge compensation was successfully demonstrated.
- Subjects :
- Image formation
Monte Carlo method
General Physics and Astronomy
chemistry.chemical_element
Insulator (electricity)
lcsh:Chemical technology
lcsh:Technology
Full Research Paper
Secondary electrons
Ion
low-angle ion scattering
Optics
surface imaging
Nanotechnology
surface morphology
General Materials Science
lcsh:TP1-1185
Electrical and Electronic Engineering
helium ion microscope
lcsh:Science
Helium
business.industry
lcsh:T
reflection microscopy
lcsh:QC1-999
Nanoscience
chemistry
lcsh:Q
business
Platinum
Field ion microscope
lcsh:Physics
Subjects
Details
- Language :
- English
- ISSN :
- 21904286
- Volume :
- 6
- Issue :
- 1
- Database :
- OpenAIRE
- Journal :
- Beilstein Journal of Nanotechnology
- Accession number :
- edsair.doi.dedup.....9dd2a92059cbdee3ddc3c45b28c0635b