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Minority anion substitution by Ni in ZnO
- Source :
- Repositório Científico de Acesso Aberto de Portugal, Repositório Científico de Acesso Aberto de Portugal (RCAAP), instacron:RCAAP, Applied physics letters 103(9), 091905 (2013). doi:10.1063/1.4820254
- Publication Year :
- 2013
- Publisher :
- AIP Publishing, 2013.
-
Abstract
- We report on the lattice location of implanted Ni in ZnO using the β - emission channeling technique. In addition to the majority substituting for the cation (Zn), a significant fraction of the Ni atoms occupy anion (O) sites. Since Ni is chemically more similar to Zn than it is to O, the observed O substitution is rather puzzling. We discuss these findings with respect to the general understanding of lattice location of dopants in compound semiconductors. In particular, we discuss potential implications on the magnetic behavior of transition metal doped dilute magnetic semiconductors. © 2013 AIP Publishing LLC. ispartof: Applied Physics Letters vol:103 issue:4 status: published
- Subjects :
- Materials science
Physics and Astronomy (miscellaneous)
Inorganic chemistry
chemistry.chemical_element
Condensed Matter
02 engineering and technology
Channelling
01 natural sciences
Ion
Condensed Matter::Materials Science
Transition metal
0103 physical sciences
DETECTORS
Physics::Atomic and Molecular Clusters
ddc:530
010306 general physics
Dopant
Doping
technology, industry, and agriculture
Magnetic semiconductor
equipment and supplies
021001 nanoscience & nanotechnology
Nickel
Crystallography
Ion implantation
chemistry
MAGNETIC SEMICONDUCTORS
EMISSION
0210 nano-technology
human activities
Subjects
Details
- ISSN :
- 10773118 and 00036951
- Volume :
- 103
- Database :
- OpenAIRE
- Journal :
- Applied Physics Letters
- Accession number :
- edsair.doi.dedup.....92f14d51c93c2b791dccaae476f85f20
- Full Text :
- https://doi.org/10.1063/1.4820254