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Scaling carbon nanotube complementary transistors to 5-nm gate lengths

Authors :
Zhiyong Zhang
Lian-Mao Peng
Mengmeng Xiao
Donglai Zhong
Yingjun Yang
Chenguang Qiu
Source :
Science (New York, N.Y.). 355(6322)
Publication Year :
2016

Abstract

Moving transistors downscale One option for extending the performance of complementary metal-oxide semiconductor (CMOS) devices based on silicon technology is to use semiconducting carbon nanotubes as the gates. Qiu et al. fabricated top-gated carbon nanotube field-effect transistors with a gate length of 5 nm. Thin graphene contacts helped maintain electrostatic control. A scaling trend study revealed that, compared with silicon CMOS devices, the nanotube-based devices operated much faster and at much lower supply voltage, and they approached the limit of one electron per switching operation. Science , this issue p. 271

Details

ISSN :
10959203
Volume :
355
Issue :
6322
Database :
OpenAIRE
Journal :
Science (New York, N.Y.)
Accession number :
edsair.doi.dedup.....92dd0fea25a0817bb76e386ea81415c5