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Scaling carbon nanotube complementary transistors to 5-nm gate lengths
- Source :
- Science (New York, N.Y.). 355(6322)
- Publication Year :
- 2016
-
Abstract
- Moving transistors downscale One option for extending the performance of complementary metal-oxide semiconductor (CMOS) devices based on silicon technology is to use semiconducting carbon nanotubes as the gates. Qiu et al. fabricated top-gated carbon nanotube field-effect transistors with a gate length of 5 nm. Thin graphene contacts helped maintain electrostatic control. A scaling trend study revealed that, compared with silicon CMOS devices, the nanotube-based devices operated much faster and at much lower supply voltage, and they approached the limit of one electron per switching operation. Science , this issue p. 271
- Subjects :
- Materials science
Silicon
chemistry.chemical_element
Nanotechnology
Hardware_PERFORMANCEANDRELIABILITY
02 engineering and technology
Carbon nanotube
01 natural sciences
law.invention
law
0103 physical sciences
Hardware_INTEGRATEDCIRCUITS
010302 applied physics
Multidisciplinary
Graphene
business.industry
Transistor
021001 nanoscience & nanotechnology
Subthreshold slope
Semiconductor
CMOS
chemistry
Inverter
Optoelectronics
0210 nano-technology
business
Hardware_LOGICDESIGN
Subjects
Details
- ISSN :
- 10959203
- Volume :
- 355
- Issue :
- 6322
- Database :
- OpenAIRE
- Journal :
- Science (New York, N.Y.)
- Accession number :
- edsair.doi.dedup.....92dd0fea25a0817bb76e386ea81415c5