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Photoresist Design for Elastomeric Light Tunable Photonic Devices

Authors :
Daniele Martella
Sara Nocentini
Camilla Parmeggiani
Diederik S. Wiersma
Source :
Materials, Materials; Volume 9; Issue 7; Pages: 525, Materials, Vol 9, Iss 7, p 525 (2016)
Publication Year :
2016
Publisher :
MDPI, 2016.

Abstract

An increasing interest in tunable photonic structures is growing within the photonic community. The usage of Liquid Crystalline Elastomer (LCE) structures in the micro-scale has been motivated by the potential to remotely control their properties. In order to design elastic photonic structures with a three-dimensional lithographic technique, an analysis of the different mixtures used in the micro-printing process is required. Previously reported LCE microstructures suffer damage and strong swelling as a limiting factor of resolution. In this article, we reported a detailed study on the writing process with four liquid crystalline photoresists, in which the percentage of crosslinker is gradually increased. The experiments reveal that exploiting the crosslinking degree is a possible means in which to obtain suspended lines with good resolution, quite good rigidity, and good elasticity, thereby preserving the possibility of deformation by light irradiation.

Details

Language :
English
ISSN :
19961944
Volume :
9
Issue :
7
Database :
OpenAIRE
Journal :
Materials
Accession number :
edsair.doi.dedup.....912e029dfad4a138d443a7c4634670cc