Multi-objective optimization of tungsten CMP slurry for advanced semiconductor manufacturing using a response surface methodology

MLA

Jinok Moon, et al. “Multi-Objective Optimization of Tungsten CMP Slurry for Advanced Semiconductor Manufacturing Using a Response Surface Methodology.” Materials & Design, vol. 117, Mar. 2017, pp. 131–38. EBSCOhost, widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....90954aa830508266e088d69ff49b8e97&authtype=sso&custid=ns315887.

APA

Jinok Moon, Dong-Hee Lee, Ungyu Paik, Joo Hyun Kim, Myoung-Jae Lee, Keungtae You, & Jihoon Seo. (2017). Multi-objective optimization of tungsten CMP slurry for advanced semiconductor manufacturing using a response surface methodology. Materials & Design, 117, 131–138.

Chicago

Jinok Moon, Dong-Hee Lee, Ungyu Paik, Joo Hyun Kim, Myoung-Jae Lee, Keungtae You, and Jihoon Seo. 2017. “Multi-Objective Optimization of Tungsten CMP Slurry for Advanced Semiconductor Manufacturing Using a Response Surface Methodology.” Materials & Design 117 (March): 131–38. http://widgets.ebscohost.com/prod/customlink/proxify/proxify.php?count=1&encode=0&proxy=&find_1=&replace_1=&target=https://search.ebscohost.com/login.aspx?direct=true&site=eds-live&scope=site&db=edsair&AN=edsair.doi.dedup.....90954aa830508266e088d69ff49b8e97&authtype=sso&custid=ns315887.