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Nanopatterning of InP(001) surface using e-beam lithography to localize InAs quantum dots for single photon source application
- Source :
- Proceedings of the 2006 IEEE LEOS Annual Meeting Conference, 2006, 2 pp
- Publication Year :
- 2006
- Publisher :
- HAL CCSD, 2006.
-
Abstract
- This work is devoted to the localization of InAs quantum dots grown by SSMBE on nanostructured InP(001) surfaces: mesas or holes are the sites of privileged nucleation of the quantum dots (QDs). Both nanostructuration methods are compared. The principle of fabrication of a photonic crystal cavity based source with localized QDs is described.
- Subjects :
- 010302 applied physics
Surface (mathematics)
Fabrication
Materials science
Condensed Matter::Other
business.industry
Nucleation
Physics::Optics
Nanotechnology
02 engineering and technology
Condensed Matter::Mesoscopic Systems and Quantum Hall Effect
021001 nanoscience & nanotechnology
01 natural sciences
Condensed Matter::Materials Science
Nanolithography
Quantum dot
Single-photon source
0103 physical sciences
Optoelectronics
0210 nano-technology
business
Electron-beam lithography
Photonic crystal cavity
Subjects
Details
- Language :
- English
- Database :
- OpenAIRE
- Journal :
- Proceedings of the 2006 IEEE LEOS Annual Meeting Conference, 2006, 2 pp
- Accession number :
- edsair.doi.dedup.....86cbf665aa01e4f48a76a8ae5e3fc8e4