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Interdependence of structural and electrical properties in tantalum/tantalum oxide multilayers
- Source :
- Surface and Coatings Technology, Surface and Coatings Technology, Elsevier, 2013, 227, pp.38-41. 〈10.1016/j.surfcoat.2012.10.064〉, Surface and Coatings Technology, Elsevier, 2013, 227, pp.38-41. ⟨10.1016/j.surfcoat.2012.10.064⟩
- Publication Year :
- 2013
- Publisher :
- Elsevier BV, 2013.
-
Abstract
- International audience; Dc reactive sputtering was used to deposit tantalum metal/oxide periodic nanometric multilayers using the innovative technique namely, the reactive gas pulsing process (RGPP). Different pulsing periods were used for each deposition to produce metal-oxide periodic alternations included between 5 and 80 nm. Structure, crystallinity and chemical composition of these films were systematically investigated by Transmission Electron Microscopy (TEM) and Energy-dispersive X-ray (EDX) spectroscopy techniques. Moreover, electrical properties were also studied by the Van der Pauw technique.
- Subjects :
- Materials science
Inorganic chemistry
Oxide
Tantalum
chemistry.chemical_element
02 engineering and technology
01 natural sciences
chemistry.chemical_compound
Crystallinity
Van der Pauw method
Sputtering
0103 physical sciences
Materials Chemistry
[SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
Thin film
Deposition (law)
010302 applied physics
Surfaces and Interfaces
General Chemistry
021001 nanoscience & nanotechnology
Condensed Matter Physics
Surfaces, Coatings and Films
chemistry
Chemical engineering
Transmission electron microscopy
[ SPI.NANO ] Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics
0210 nano-technology
Subjects
Details
- ISSN :
- 02578972
- Volume :
- 227
- Database :
- OpenAIRE
- Journal :
- Surface and Coatings Technology
- Accession number :
- edsair.doi.dedup.....856aaecc5319255f60aa17e6119ce27b
- Full Text :
- https://doi.org/10.1016/j.surfcoat.2012.10.064