X-ray Based in Situ Investigation of Silicon Growth Mechanism Dynamics - Application to Grain and Defect Formation

MLA

Nathalie Mangelinck-Noël, et al. X-Ray Based in Situ Investigation of Silicon Growth Mechanism Dynamics - Application to Grain and Defect Formation. Jan. 2020. EBSCOhost, https://doi.org/10.3390/cryst10070555⟩.

APA

Nathalie Mangelinck-Noël, Elodie Boller, Vasiliki Stamelou, M.G. Tsoutsouva, Alexander Rack, Thècle Riberi-Béridot, Isabelle Périchaud, Guillaume Reinhart, Fabrice Guittonneau, Maike Becker, Hadjer Ouaddah, Laurent Barrallier, Gabrielle Regula, Jean-Paul Valade, & José Baruchel. (2020). X-ray Based in Situ Investigation of Silicon Growth Mechanism Dynamics - Application to Grain and Defect Formation. https://doi.org/10.3390/cryst10070555⟩

Chicago

Nathalie Mangelinck-Noël, Elodie Boller, Vasiliki Stamelou, M.G. Tsoutsouva, Alexander Rack, Thècle Riberi-Béridot, Isabelle Périchaud, et al. 2020. “X-Ray Based in Situ Investigation of Silicon Growth Mechanism Dynamics - Application to Grain and Defect Formation,” January. doi:10.3390/cryst10070555⟩.