Back to Search Start Over

Properties of graphene-metal contacts probed by Raman spectroscopy

Authors :
J. H. Chu
Fang Liang
Chen Luo
Hejun Xu
Edmond Orignac
Jian Zhang
Xing Wu
Xinming Li
Shanghai Key Laboratory of Multidimensional Information Processing
East China Normal University [Shangaï] (ECNU)
Department of Electronic Engineering
The Chinese University of Hong Kong [Hong Kong]
Laboratoire de Physique de l'ENS Lyon (Phys-ENS)
École normale supérieure - Lyon (ENS Lyon)-Centre National de la Recherche Scientifique (CNRS)-Université Claude Bernard Lyon 1 (UCBL)
Université de Lyon-Université de Lyon
East China Normal University et Ecole Normale Supérieure de Lyon
JORISS project 'Transport investigation of Dirac/Weyl matter'
École normale supérieure de Lyon (ENS de Lyon)-Université Claude Bernard Lyon 1 (UCBL)
Université de Lyon-Université de Lyon-Centre National de la Recherche Scientifique (CNRS)
Source :
Carbon, Carbon, Elsevier, 2018, 127, pp.491-497. ⟨10.1016/j.carbon.2017.11.035⟩, Carbon, 2018, 127, pp.491-497. ⟨10.1016/j.carbon.2017.11.035⟩
Publication Year :
2018
Publisher :
Elsevier BV, 2018.

Abstract

International audience; The high intrinsic carrier mobility of graphene has drawn much attention. However, the high contact resistance between the graphene and metal electrode limits the application of high-speed graphene-based transistors. In this work, we combined both electrical characterization and Raman spectroscopy to study the contact resistance issue in graphene field effect transistor (FET). As FET size scaling down, the graphene-metal contact resistance is found to be a significant contributor to the total resistance. The signature of the graphene/metal bonding with various metal electrodes is probed by using high-resolution Raman spectroscopy. Graphene-metal Raman signals vary on different metal electrodes. This study unearths the properties of the graphene/metal bonding, and paves a way for the investigations into improving the stability and scalability of the graphene-based transistor for future high-speed nanoelectronics.

Details

ISSN :
00086223
Volume :
127
Database :
OpenAIRE
Journal :
Carbon
Accession number :
edsair.doi.dedup.....829233df8345775fb5f05ca934837f88