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Study of parasitic trapping in alumina used as blocking oxide for nonvolatile memories

Authors :
Philippe Blaise
Jean-Paul Barnes
Gabriel Molas
Marc Veillerot
Névine Rochat
J.-P. Colonna
K. Yckache
D. Lafond
Christophe Licitra
H. Grampeix
Marc Bocquet
L. Masoero
Vincent Vidal
Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI)
Direction de Recherche Technologique (CEA) (DRT (CEA))
Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)
Source :
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, American Vacuum Society (AVS), 2011, 29 (1), pp.159-165. ⟨10.1116/1.3535552⟩, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2011, 29 (1), pp.159-165. ⟨10.1116/1.3535552⟩
Publication Year :
2011
Publisher :
HAL CCSD, 2011.

Abstract

International audience; Alumina layers deposited by Atomic Layer Deposition followed by Rapid Thermal anneal were characterized. We found that the crystallization of alumina in γ-phase occurs between 700 and 850°C. Optical band gap, stress and density were found to increase upon crystallization Hydrogen content in alumina was characterized by ToF-SIMS and infrared spectroscopy. We found that annealing ambience has a strong influence on hydrogen concentration: oxygen favors hydrogen desorption from alumina. Finally, charge trapping in alumina was characterized by C(V) measurements. A strong correlation between hydrogen concentration and trapping was established.

Details

Language :
English
ISSN :
0734211X and 15208567
Database :
OpenAIRE
Journal :
Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, American Vacuum Society (AVS), 2011, 29 (1), pp.159-165. ⟨10.1116/1.3535552⟩, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures, 2011, 29 (1), pp.159-165. ⟨10.1116/1.3535552⟩
Accession number :
edsair.doi.dedup.....7d339975dbbc5ab5b1aa50ee7447b53b
Full Text :
https://doi.org/10.1116/1.3535552⟩