Atomic description of elementary surface processes: diffusion and dynamics

A large fraction of processes which are at the foundation of our technological society involve physical and chemical properties of surfaces. Catalytic reactions and semiconductor devices production are two of the most important ones. This paper describes a sample of some of the most relevant surface science experiments which have been recently performed, in order to understand elementary surface processes of model catalytic reactions and in semiconductor technology at the atomic level. The focus is on experiments performed with scanning tunneling microscopy and atomic force microscopy which have represented, in some cases, real breakthroughs in our understanding of these phenomena. We then present an overview of possible experimental technique developments that can be foreseen for the future and that may give us a more in-depth understanding of the elementary processes which form the basis of important complex surface phenomena. Finally, some of the challenging tasks that lie ahead for surface scientists and the collateral opportunities are discussed.