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Micromachined X-ray collector for space astronomy
- Source :
- Sensors and Actuators A: Physical. :201-206
- Publication Year :
- 2008
- Publisher :
- Elsevier, 2008.
-
Abstract
- A novel micromachined X-ray collector using anisotropically etched Si(1 1 1) side walls as X-ray mirrors for future astronomical missions is reported. The collector was designed to converge a ϕ 100 mm parallel X-ray beam into a ϕ 4 mm focus. In order to obtain smooth Si(1 1 1) side walls, dynashock-type ultrasonic waves were added during the anisotropic KOH etching. The surface roughness on the order of nm or less was achieved. The sidewalls or the X-ray mirrors were diced from the wafer as mirror chips and then adhered to a mount formed by deep reactive ion etching. The first light image was successfully obtained at Al K α 1.49 keV in a ISAS 30 m-long X-ray beam line.
- Subjects :
- Materials science
business.industry
Metals and Alloys
Deep reactive ion etching
Anisotropic wet etching
Condensed Matter Physics
Surfaces, Coatings and Films
Electronic, Optical and Magnetic Materials
Optics
Beamline
Etching (microfabrication)
X-ray collector
Surface roughness
Deep reactive-ion etching
Ultrasonic sensor
Wafer
Electrical and Electronic Engineering
Reactive-ion etching
business
Instrumentation
Beam (structure)
Subjects
Details
- Language :
- English
- ISSN :
- 09244247
- Database :
- OpenAIRE
- Journal :
- Sensors and Actuators A: Physical
- Accession number :
- edsair.doi.dedup.....74eaa157da42f106ddbe4a993ea73240