Transferrable Plasmonic Au Thin Film Containing Sub-20 nm Nanohole Array Constructed via High-Resolution Polymer Self-Assembly and Nanotransfer Printing

The fabrication and characterization of nanoscale hole arrays (NHA) have been extensively performed for a variety of unique characteristics including extraordinary optical transmission phenomenon observed for plasmonic NHAs. Although the size miniaturization and hole densification are strongly required for enhancement of high-frequency optical responses, from a practical point-of-view, it is still not straightforward to manufacture NHA using conventional lithography techniques. Herein, a facile, cost-effective, and transferrable fabrication route for high-resolution and high-density NHA with sub-50 nm periodicity is demonstrated. Solvent-assisted nanotransfer printing with ultrahigh-resolution combined with block copolymer self-assembly is used to fabricate well-defined Si nanomesh master template with 4-fold symmetry. An Au NHA film on quartz substrate is then obtained by thermal-evaporation on the Si master and subsequent transfer of the sample, resulting in NHA structure having a hole with a diameter of 18 nm and a density over 400 holes/μm