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High Pressure Processing of Ion Implanted GaN

Authors :
Boleslaw Lucznik
Kacper Sierakowski
M. Iwinska
Pawel Kwiatkowski
Marcin Turek
Michal Bockowski
Rafal Jakiela
Hideki Sakurai
Tetsu Kachi
Source :
Electronics, Vol 9, Iss 1380, p 1380 (2020)
Publication Year :
2020
Publisher :
MDPI AG, 2020.

Abstract

It is well known that ion implantation is one of the basic tools for semiconductor device fabrication. The implantation process itself damages, however, the crystallographic lattice of the semiconductor. Such damage can be removed by proper post-implantation annealing of the implanted material. Annealing also allows electrical activation of the dopant and creates areas of different electrical types in a semiconductor. However, such thermal treatment is particularly challenging in the case of gallium nitride since it decomposes at relatively low temperature (~800 °C) at atmospheric pressure. In order to remove the implantation damage in a GaN crystal structure, as well as activate the implanted dopants at ultra-high pressure, annealing process is proposed. It will be described in detail in this paper. P-type GaN implanted with magnesium will be briefly discussed. A possibility to analyze diffusion of any dopant in GaN will be proposed and demonstrated on the example of beryllium.

Details

Language :
English
ISSN :
20799292
Volume :
9
Issue :
1380
Database :
OpenAIRE
Journal :
Electronics
Accession number :
edsair.doi.dedup.....6f6971f9d606f84a18b88c3e3404c211